The titanium silicide nitride (TiSiN) layer may be formed using a chemical vapor deposition (CVD) process. For example, titanium tetrachloride (TiCl 4), ammonia ...

Description. translated from ... This application is related to U.S. patent application entitled "Chemical Vapor Deposition (CVD) Process for Thermally Depositing ...

Jul 13, 2022 ... A chemical vapor deposition (CVD) process for producing diamond, the process comprising: providing a CVD growth chamber containing a growth substrate.

Summarizing the invention, it comprises continuously introducing into the CVD hexafluoride system a controlled amount of oxygen or oxygen-forming material ...

Metal foam: porous nickel foam is a typical sacrificial template used for the in-situ growth of 3D graphene networks via a chemical vapor deposition (CVD) ...

May 17, 2017 ... The present invention relates to a chemical vapor deposition (CVD) process chamber component positioned within a chemical vapor deposition ...

An exemplary CVD process is the deposition of tungsten metal on a semiconductor wafer. A preferred method and apparatus uses a capillary gas sampling device for ...

1 is a schematic diagram of a chemical vapor deposition (CVD) apparatus in which the present processes can be carried out. [0025]. Referring to Fig. 1, a vacuum ...

[0001] Carbon chemical vapor deposition (CVD) processes are increasingly prevalent for hard-mask application for semiconductor device fabrication. As ...

A method for cleaning a chemical vapor deposition (CVD) process for depositing tungsten. After the tungsten has been deposited and the wafer has been ...

This application describes a bulk and thin film chemical vapor deposition (CVD) process using lasers to heat a silicon substrate to the required deposition ...

The present invention is a chemical vapor deposition of tungsten(W-CVD)process for growing low stress and void free interconnect. The method of this ...

As a method for manufacturing precious-metal or a precious-metal film is utilized a chemical vapor deposition process (hereinafter, referred to as a CVD process) ...

... coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating; C23C16/455—Chemical coating by decomposition of gaseous ...

Chemical vapor deposition process where an alkaline earth metal organic precursor material is volatilized in the presence of an amine or ammonia and deposited ...

... chemical vapor deposition is disclosed. The process provides deposited titanium layers having a ... coating, i.e. chemical vapour deposition [CVD] processes.

Chemical vapor deposition ("CVD") is a gas reaction process commonly used in the semiconductor industry to form thin layers of material known as films over ...

A method of film deposition in a chemical vapor deposition (CVD) process includes (a) providing a model for CVD deposition of a film that defines a ...

... coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating; C23C16/458—Chemical coating by decomposition of gaseous ...

Chemical vapor deposition (CVD) of aluminum oxide is used conventionally in various applications in view of the various advantageous properties of Al 2O 3, ...